Search results for "soft lithography"

Fast and blister-free irradiation conditions for cross-linking of PMMA induced by 2MeV protons

2013

For soft lithography, the conventional negative tone resists, such as SU-8, that are used to create the mold have a number of drawbacks. PMMA, which is normally used as a positive tone resist, can be used as a negative resist by using high-fluence irradiation conditions. In this report, we outline optimization of the irradiation conditions for PMMA thin films using 2MeV H^+ ions to exploit their ability to work as a negative tone resist at ion fluences above 1.0x10^1^5ionscm^-^2. The main aim was to induce cross-linking while maintaining the exposed regions free of blisters and maintaining short irradiation times. We found that by using a two-step process with a low-flux irradiation, follow…

Patterning of supported gold monolayers via chemical lift-off lithography

2017

The supported monolayer of Au that accompanies alkanethiolate molecules removed by polymer stamps during chemical lift-off lithography is a scarcely studied hybrid material. We show that these Au–alkanethiolate layers on poly(dimethylsiloxane) (PDMS) are transparent, functional, hybrid interfaces that can be patterned over nanometer, micrometer, and millimeter length scales. Unlike other ultrathin Au films and nanoparticles, lifted-off Au–alkanethiolate thin films lack a measurable optical signature. We therefore devised fabrication, characterization, and simulation strategies by which to interrogate the nanoscale structure, chemical functionality, stoichiometry, and spectral signature of t…

Influence of MeV H+ ion beam flux on cross-linking and blister formation in PMMA resist

2012

In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam. Here we have investigated the irradiation conditions for achieving complete cross-linking and absence of blister formation in PMMA so that its negative characteristic can be used in making master moulds. PMMA thin films approximately 9 µm thick on Si were deposited by spin coating. The 2-MeV H+ ion beam was generated using a 1.7-MV tandem Tandetron accelerator. The beam was collimated to a 500×500 µm2 cross section using programmable proxi…

Development of elastomeric lab-on-a-chip devices through Proton Beam Writing (PBW) based fabrication strategies

2009

Abstract In recent years, one of the most exciting developments in fluidic device applications is the rapid evolution of miniaturized micro- and nanofluidic systems, the so called “lab-on-a-chip” devices. These devices integrate laboratory functions into a single chip, and are capable of various biochemical analysis and synthesis, such as sample injection and preparation, single cell/molecule observation, bioparticle sequencing and sorting etc. The evolvement of lab-on-a-chip concept implies the use of novel fabrication techniques for the construction of versatile analytical components in a fast and reproducible manner. Endowed with unique three-dimensional fabrication abilities, Proton Bea…

Biosilica electrically-insulating layers by soft lithography-assisted biomineralisation with recombinant silicatein.

2011

New Developments in Soft Lithography

2003

Abstract The burgeoning area of soft lithography is reviewed with special emphasis on developments within the past three years. Applications in electronics have driven such developments, but more recently, other kinds of device structures and 3D prototyping have also found application, in part, through soft lithography. Microcontact printing (μCP), “lift off” μCP nano transfer printing (nTP), micromolding in capillaries (MIMIC), solvent assisted micromolding (SAMIM), replica molding (REM), and microtransfer molding are the main soft lithography schemes discussed.

Polyelectrolytes on block copolymer surfaces

2004

Soft lithography and properties of amphiphilic block copolymers are combined in a new technique for the generation of patterned substrates, which can be used in different ways as templates for further processing. In these processing steps the deposition of polyelectrolytes, metals and grafting from polymerizations are used for the construction of different structures.

Microstructuring of phospholipid bilayers on gold surfaces by micromolding in capillaries

2005

Microstructuring of lipid bilayers on gold surfaces was achieved by micromolding in capillaries employing chemically modified polydimethylsiloxane (PDMS). Microfluidic networks of PDMS were prepared by micromolding and functionalized with thiol end-groups using 3-mercaptopropyltrimethoxysilane. The PDMS stamps were firmly attached to the gold substrate via quasi-covalent linkage providing a tight seal, a prerequisite for establishing individual addressable capillaries. Bilayers composed of POPC/POPG were subsequently prepared on microstructured self assembly monolayers of 11-amino-1-undecanethiol via strong electrostatic interactions. This way it is possible to generate individually address…

Visualization of Molecular Recognition Events on Microstructured Lipid-Membrane Compartments by In Situ Scanning Force Microscopy This work was suppo…

2002

Large-scale Nanopatterning of Single Proteins used as Carriers of Magnetic Nanoparticles

2010

4 páginas, 4 figuras.